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dc.contributor.authorChang, YAen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorLu, CYen_US
dc.contributor.authorKuo, YKen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:19:04Z-
dc.date.available2014-12-08T15:19:04Z-
dc.date.issued2005-06-01en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0268-1242/20/6/020en_US
dc.identifier.urihttp://hdl.handle.net/11536/13686-
dc.description.abstractContinuous-wave (CW) mode operation InGaAsN/GaAsN double-quantum-well lasers with a laser wavelength of 1.295 mu m are demonstrated by metal-organic chemical vapour deposition (MOCVD). With the use of a high-bandgap GaAs0.9P0.1 into the active region before the growth of p-type layers, a room temperature (RT) threshold current of 99 mA and the characteristic temperature (TO) values of 155 K in a temperature range of 25-95 degrees C and 179 K in a temperature range of 25-85 degrees C are obtained from a 4 x 1000 mu m(2) ridge waveguide uncoated laser diode. The To value of the conventional structure without the high-bandgap GaAs0.9P0.1 is 118 K in a temperature range of 25-95 degrees C. High-temperature performance is improved and the results of numerical analysis suggest that it may be attributed to the reduced electronic leakage current.en_US
dc.language.isoen_USen_US
dc.titleImproving high-temperature performance in continuous-wave mode InGaAsN/GaAsN ridge waveguide lasersen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0268-1242/20/6/020en_US
dc.identifier.journalSEMICONDUCTOR SCIENCE AND TECHNOLOGYen_US
dc.citation.volume20en_US
dc.citation.issue6en_US
dc.citation.spage601en_US
dc.citation.epage605en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000230260700021-
dc.citation.woscount1-
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