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dc.contributor.authorLin, GRen_US
dc.contributor.authorLin, CJen_US
dc.contributor.authorLin, CKen_US
dc.contributor.authorChou, LJen_US
dc.contributor.authorChueh, YLen_US
dc.date.accessioned2014-12-08T15:19:10Z-
dc.date.available2014-12-08T15:19:10Z-
dc.date.issued2005-05-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1886274en_US
dc.identifier.urihttp://hdl.handle.net/11536/13731-
dc.description.abstractThe mechanisms for silicon (Si) defect and nanocrystal related white and near-infrared electroluminescences (ELs) of Si-rich SiO2 films synthesized by Si-ion implantation and plasma-enhanced chemical-vapor deposition (PECVD) are investigated. The strong photoluminescence (PL) of Si-ion-implanted SiO2 (SiO2:Si+) at 415-455 nm contributed by weak-oxygen bond and neutral oxygen vacancy defects is observed after 1100 degrees C annealing for 180 min. The white-light EL of a reverse-biased SiO2:Si+ metal-oxide-semiconductor (MOS) diode with a turn-on voltage of 3.3 V originates from the minority-carrier tunneling and recombination in the defect states of SiO2:Si+, which exhibits maximum EL power of 120 nW at bias of 15 V with a power-current slope of 2.2 mu W/A. The precipitation of nanocrystallite silicon (nc-Si) in SiO2:Si+ is less pronounced due to relatively small excess Si density. In contrast, the 4-nm nc-Si contributed to PL and EL at about 760 nm is precipitated in the PECVD-grown Si-rich SiOx film after annealing at 1100 degrees C for 30 min. The indium-tin-oxide/Si-rich SiOx/p-Si/Al metal oxide semiconductor (MOS) diode is highly resistive with turn-on voltage and power-current (P-I) slope of 86 V and 0.7 mW/A, respectively. The decomposed EL peaks at 625 and 768 nm are contributed by the bias-dependent cold-carrier tunneling between the excited states in adjacent nc-Si quantum dots. (C) 2005 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleOxygen defect and Si nanocrystal dependent white-light and near-infrared electroluminescence of Si-implanted and plasma-enhanced chemical-vapor deposition-grown Si-rich SiO2en_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1886274en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume97en_US
dc.citation.issue9en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000229155600080-
dc.citation.woscount118-
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