Title: Some Dielectric and Conduction Properties of the r.f. Reactively Sputtered Al2O3 Thin Film
Authors: 陳茂傑
M.C.Chen
Issue Date: Jan-1972
Publisher: 交大學刊編輯委員會
Abstract: Dielectric films of Al2O3 were prepared by r.f. reactive sputtering. Investigation was then made on their dielectric dispersion and leakage characteristics.
URI: http://hdl.handle.net/11536/137478
Journal: 交大學刊
SCIENCE BULLETIN NATIONAL CHIAO-TUNG UNIVERSITY
Volume: 5
Issue: 2
Begin Page: 69
End Page: 74
Appears in Collections:Science Bulletin National Chiao-Tung University


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