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dc.contributor.authorJiang, Iris Hui-Ruen_US
dc.contributor.authorChang, Hua-Yuen_US
dc.contributor.authorChang, Liang-Gien_US
dc.contributor.authorHung, Huang-Bien_US
dc.date.accessioned2014-12-08T15:19:20Z-
dc.date.available2014-12-08T15:19:20Z-
dc.date.issued2009en_US
dc.identifier.isbn978-1-60558-497-3en_US
dc.identifier.issn0738-100Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/13812-
dc.description.abstractMetal-only ECO realizes the last-minute design changes by revising the photomasks of metal layers only. This task is challenging because the pre-injected spare cells are limited both in number and in cell types. This paper proposes a matching-based EGO synthesizer, named EGOS, that correctly implements the incremental design changes using the available spare cells as well as tries to reduce the prohibitive photomask cost at the same time. The experiments are conducted on five industrial testcases. ECOS uses less photomask costs to complete design changes for all cases than the direct method that transforms the widely-used hand-editing procedure into an automatic one.en_US
dc.language.isoen_USen_US
dc.subjectEGOen_US
dc.subjectspare cellsen_US
dc.subjectresynthesisen_US
dc.subjectphysical synthesisen_US
dc.subjectmatchingen_US
dc.titleMatching-Based Minimum-Cost Spare Cell Selection for Design Changesen_US
dc.typeArticleen_US
dc.identifier.journalDAC: 2009 46TH ACM/IEEE DESIGN AUTOMATION CONFERENCE, VOLS 1 AND 2en_US
dc.citation.spage408en_US
dc.citation.epage411en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000279394200083-
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