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dc.contributor.authorJuan, CPen_US
dc.contributor.authorTsai, CCen_US
dc.contributor.authorChen, KHen_US
dc.contributor.authorChen, LCen_US
dc.contributor.authorCheng, HCen_US
dc.date.accessioned2014-12-08T15:19:23Z-
dc.date.available2014-12-08T15:19:23Z-
dc.date.issued2005-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.44.2612en_US
dc.identifier.urihttp://hdl.handle.net/11536/13846-
dc.description.abstractWe have proposed and fabricated a vertical lateral field emission device (LFED) based on carbon nanotubes (CNTs). It combines high-performance nanomaterials with mature solid-state fabrication technology to produce miniaturized vacuum devices with superior field emission characteristics. The techniques employed are very simple and allow for good reproducibility in controlling the short distance from the polysilicon anode to the CNTs cathode inter-electrode distance. The inter-electrode gap can be easily fabricated to be less than 1 mu m by a wet etching process without using fine lithography. The CNTs were selectively grown using a microwave-plasma enhanced chemical vapor deposition system (MPCVD). The anode-to-emitter gap distance and the length of carbon nanotubes are well controlled to enable investigation of their effect on the field emission properties. The turn-on voltage of the fabricated device with an inter-electrode gap of 0.53 mu m is as low as 0.2V, and the emission current is as high as 9.72mA at 10V. The emission current fluctuation is approximately +/- 3.5% for 1500s.en_US
dc.language.isoen_USen_US
dc.subjectcarbon nanotubesen_US
dc.subjectlateral field emission devicesen_US
dc.subjectturn-on voltageen_US
dc.subjectMPCVDen_US
dc.subjectemission current fluctuationen_US
dc.titleFabrication and characterization of lateral field emission device based on carbon nanotubesen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.44.2612en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume44en_US
dc.citation.issue4Ben_US
dc.citation.spage2612en_US
dc.citation.epage2617en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000229095700117-
dc.citation.woscount3-
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