Improvement in instable analysis of heat inflation induced line-width after replacing pellicle with diamond film on reticle (photo-masks)

doi:10.1016/j.mee.2004.11.013

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Kuo, YK	en_US
dc.contributor.author	Chao, CG	en_US
dc.date.accessioned	2014-12-08T15:19:29Z	-
dc.date.available	2014-12-08T15:19:29Z	-
dc.date.issued	2005-04-01	en_US
dc.identifier.issn	0167-9317	en_US
dc.identifier.uri	http://dx.doi.org/10.1016/j.mee.2004.11.013	en_US
dc.identifier.uri	http://hdl.handle.net/11536/13880	-
dc.description.abstract	A new reticle is designed that takes advantage of the high value of thermal conductivity of diamond to add a layer of diamond film to the bottom of traditional pellicle-reticle; that is, the new reticle replaces the pellicle with a diamond material. This method may help maintain the future manufacturing process of photo-lithography below 35 nm and can improve the problem of slightly out of shape reticle caused by the long-term effects of light and thermal energy. (c) 2004 Elsevier B.V. All rights reserved.	en_US
dc.language.iso	en_US	en_US
dc.title	Improvement in instable analysis of heat inflation induced line-width after replacing pellicle with diamond film on reticle (photo-masks)	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1016/j.mee.2004.11.013	en_US
dc.identifier.journal	MICROELECTRONIC ENGINEERING	en_US
dc.citation.volume	77	en_US
dc.citation.issue	3-4	en_US
dc.citation.spage	297	en_US
dc.citation.epage	301	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
dc.contributor.department	Department of Materials Science and Engineering	en_US
dc.identifier.wosnumber	WOS:000228797200015	-
dc.citation.woscount	1	-
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