完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 黃柏文 | zh_TW |
| dc.contributor.author | 張國明 | zh_TW |
| dc.contributor.author | 吳建宏 | zh_TW |
| dc.contributor.author | Huang, Bo-Wen | en_US |
| dc.contributor.author | Chang, Kow-Ming | en_US |
| dc.contributor.author | Wu, Chien-Hung | en_US |
| dc.date.accessioned | 2018-01-24T07:37:07Z | - |
| dc.date.available | 2018-01-24T07:37:07Z | - |
| dc.date.issued | 2016 | en_US |
| dc.identifier.uri | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070180102 | en_US |
| dc.identifier.uri | http://hdl.handle.net/11536/138992 | - |
| dc.language.iso | en_US | en_US |
| dc.subject | 雙重電漿處理 | zh_TW |
| dc.subject | 大氣常壓電漿輔助化學氣相沉積系統 | zh_TW |
| dc.subject | 內氫電漿處理 | zh_TW |
| dc.subject | 中性離子束再氧化效應 | zh_TW |
| dc.subject | 電壓變溫可靠度 | zh_TW |
| dc.subject | Dual Plasma Treatment | en_US |
| dc.subject | AP-PECVD | en_US |
| dc.subject | in-situ hydrogen Plasma Treatment | en_US |
| dc.subject | Neutral Beam Re-oxidation | en_US |
| dc.subject | Bias Temperature Instabilities | en_US |
| dc.title | 低溫製程技術處理於低溫多晶矽薄膜電晶體及大氣常壓電漿輔助化學氣相沉積製備銦鎵鋅氧薄膜電晶體之探討 | zh_TW |
| dc.title | Investigation on High Performance of Poly-Si and AP-PECVD Fabricated In-Ga-Zn-O Thin Film Transistors with Low Temperature Technology | en_US |
| dc.type | Thesis | en_US |
| dc.contributor.department | 電子工程學系 電子研究所 | zh_TW |
| 顯示於類別： | 畢業論文 | |
