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dc.contributor.author林孟幃zh_TW
dc.contributor.author張翼zh_TW
dc.contributor.authorLin, Meng-Weien_US
dc.contributor.authorChang, Edward-Yien_US
dc.date.accessioned2018-01-24T07:38:09Z-
dc.date.available2018-01-24T07:38:09Z-
dc.date.issued2015en_US
dc.identifier.urihttp://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070151519en_US
dc.identifier.urihttp://hdl.handle.net/11536/139585-
dc.language.isoen_USen_US
dc.subject二維材料zh_TW
dc.subject二硫化鉬zh_TW
dc.subject電晶體zh_TW
dc.subject氬電漿zh_TW
dc.subject接觸電阻zh_TW
dc.subject傳輸線模型zh_TW
dc.subject2D materialen_US
dc.subjectMoS2en_US
dc.subjecttransistoren_US
dc.subjectAr plasmaen_US
dc.subjectcontact resistanceen_US
dc.subjectTLMen_US
dc.title二維材料二硫化鉬電晶體製程技術開發之研究zh_TW
dc.titleThe Study of Process Development on Transition Metal Dichalcognides MoS2 Transistoren_US
dc.typeThesisen_US
dc.contributor.department材料科學與工程學系所zh_TW
Appears in Collections:Thesis