二維材料二硫化鉬電晶體製程技術開發之研究

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	林孟幃	zh_TW
dc.contributor.author	張翼	zh_TW
dc.contributor.author	Lin, Meng-Wei	en_US
dc.contributor.author	Chang, Edward-Yi	en_US
dc.date.accessioned	2018-01-24T07:38:09Z	-
dc.date.available	2018-01-24T07:38:09Z	-
dc.date.issued	2015	en_US
dc.identifier.uri	http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070151519	en_US
dc.identifier.uri	http://hdl.handle.net/11536/139585	-
dc.language.iso	en_US	en_US
dc.subject	二維材料	zh_TW
dc.subject	二硫化鉬	zh_TW
dc.subject	電晶體	zh_TW
dc.subject	氬電漿	zh_TW
dc.subject	接觸電阻	zh_TW
dc.subject	傳輸線模型	zh_TW
dc.subject	2D material	en_US
dc.subject	MoS2	en_US
dc.subject	transistor	en_US
dc.subject	Ar plasma	en_US
dc.subject	contact resistance	en_US
dc.subject	TLM	en_US
dc.title	二維材料二硫化鉬電晶體製程技術開發之研究	zh_TW
dc.title	The Study of Process Development on Transition Metal Dichalcognides MoS2 Transistor	en_US
dc.type	Thesis	en_US
dc.contributor.department	材料科學與工程學系所	zh_TW
顯示於類別：	畢業論文