低溫非晶態鎢摻雜氧化銦薄膜電晶體技術之研究

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	陳柏文	zh_TW
dc.contributor.author	劉柏村	zh_TW
dc.contributor.author	Chen, Po-Wen	en_US
dc.contributor.author	Liu, Po-Tsun	en_US
dc.date.accessioned	2018-01-24T07:38:36Z	-
dc.date.available	2018-01-24T07:38:36Z	-
dc.date.issued	2016	en_US
dc.identifier.uri	http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070350521	en_US
dc.identifier.uri	http://hdl.handle.net/11536/139889	-
dc.language.iso	en_US	en_US
dc.subject	薄膜電晶體	zh_TW
dc.subject	銦鎢氧	zh_TW
dc.subject	銦鎵鋅氧	zh_TW
dc.subject	保護層	zh_TW
dc.subject	低溫製程	zh_TW
dc.subject	thin film transistor	en_US
dc.subject	IWO	en_US
dc.subject	IGZO	en_US
dc.subject	passivation	en_US
dc.subject	low-temperature	en_US
dc.title	低溫非晶態鎢摻雜氧化銦薄膜電晶體技術之研究	zh_TW
dc.title	Study on Low Temperature Amorphous Tungsten doped Indium Oxide Thin Film Transistor Technology	en_US
dc.type	Thesis	en_US
dc.contributor.department	光電工程研究所	zh_TW
顯示於類別：	畢業論文