微影製程中光阻塗佈異常箭影的改善研究

Full metadata record

DC Field	Value	Language
dc.contributor.author	張正甫	zh_TW
dc.contributor.author	吳耀銓	zh_TW
dc.contributor.author	Chang, Cheng-Fu	en_US
dc.contributor.author	Wu, Yew-chung	en_US
dc.date.accessioned	2018-01-24T07:40:22Z	-
dc.date.available	2018-01-24T07:40:22Z	-
dc.date.issued	2016	en_US
dc.identifier.uri	http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070261308	en_US
dc.identifier.uri	http://hdl.handle.net/11536/141217	-
dc.language.iso	zh_TW	en_US
dc.subject	微影製程	zh_TW
dc.subject	光阻塗佈	zh_TW
dc.subject	箭影異常	zh_TW
dc.subject	光阻流體	zh_TW
dc.subject	旋轉塗佈異常	zh_TW
dc.subject	Lithography	en_US
dc.subject	photoresist coating	en_US
dc.subject	abnormal shadow arrows	en_US
dc.subject	resist fluid	en_US
dc.subject	Resist spin coating abnormal	en_US
dc.title	微影製程中光阻塗佈異常箭影的改善研究	zh_TW
dc.title	Improvement of Photoresist coating abnormal shadow arrow study in Lithography Production	en_US
dc.type	Thesis	en_US
dc.contributor.department	工學院半導體材料與製程設備學程	zh_TW
Appears in Collections:	Thesis