| Title: | 源/汲極活化與磷離子擴散行為對連續波雷射結 晶之N型多晶鍺薄膜電晶體之研究 Study on the S/D Activation and Phosphorus Diffusion Condition for the N-Channel Polycrystalline-Germanium Thin-Film Transistors via Continuous Wave Laser Crystallization |
| Authors: | 梁皓翔 鄭晃忠 Liang, Hao-Hsiang Cheng, Huang-Chung 電子研究所 |
| Keywords: | 磷離子擴散;多晶鍺薄膜電晶體;連續波雷射結晶;源/汲極活化;綠光奈秒脈衝雷射退火;Phosphorus Diffusion;Polycrystalline-Germanium Thin-Film Transistors;Continuous Wave Laser Crystallization;green nano-second laser annealing |
| Issue Date: | 2017 |
| URI: | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070450166 http://hdl.handle.net/11536/142264 |
| Appears in Collections: | Thesis |
- 連續波雷射結晶及反向摻雜應用於低溫p型多晶鍺薄膜電晶體之研究 / 吳俊毅;鄭晃忠;Wu, Chun-Yi;Cheng, Huang-Chung
- High-Performance Low-Temperature p-Channel Polycrystalline-Germanium Thin-Film Transistors via Continuous Wave Laser Crystallization / Wu, Chun-Vi;Li, Yi-Shao;Chou, Chia-Hsin;Cheng, Huang-Chung
- High-performance n-channel polycrystalline germanium thin-film transistors via continuous-wave laser crystallization and green nanosecond laser annealing for source and drain dopant activation / Li, Yi-Shao;Liang, Hao-Hsiang;Wu, Chun-Yi;Huang, Wen-Hsien;Luo, Jun-Dao
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