標題: Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold
作者: Lin, Huang-Yu
Sher, Chin-Wei
Hsieh, Dan-Hua
Chen, Xin-Yin
Chen, Huang-Ming Philip
Chen, Teng-Ming
Lau, Kei-May
Chen, Chyong-Hua
Lin, Chien-Chung
Kuo, Hao-Chung
光電系統研究所
應用化學系
光電工程學系
Institute of Photonic System
Department of Applied Chemistry
Department of Photonics
公開日期: 1-Oct-2017
摘要: In this study, a full-color emission red-green-blue (RGB) quantum-dot (QD)-based micro-light-emitting-diode (micro-LED) array with the reduced optical cross-talk effect by a photoresist mold has been demonstrated. The UV micro-LED array is used as an efficient excitation source for the QDs. The aerosol jet technique provides a narrow linewidth on the micrometer scale for a precise jet of QDs on the micro-LEDs. To reduce the optical cross-talk effect, a simple lithography method and photoresist are used to fabricate the mold, which consists of a window for QD jetting and a blocking wall for cross-talk reduction. The cross-talk effect of the well-confined QDs in the window is confirmed by a fluorescence microscope, which shows clear separation between QD pixels. A distributed Bragg reflector is covered on the micro-LED array and the QDs' jetted mold to further increase the reuse of UV light. The enhanced light emission of the QDs is 5%, 32%, and 23% for blue, green, and red QDs, respectively. (C) 2017 Chinese Laser Press
URI: http://dx.doi.org/10.1364/PRJ.5.000411
http://hdl.handle.net/11536/143848
ISSN: 2327-9125
DOI: 10.1364/PRJ.5.000411
期刊: PHOTONICS RESEARCH
Volume: 5
起始頁: 411
結束頁: 416
Appears in Collections:Articles