完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin, Huang-Yu | en_US |
dc.contributor.author | Sher, Chin-Wei | en_US |
dc.contributor.author | Hsieh, Dan-Hua | en_US |
dc.contributor.author | Chen, Xin-Yin | en_US |
dc.contributor.author | Chen, Huang-Ming Philip | en_US |
dc.contributor.author | Chen, Teng-Ming | en_US |
dc.contributor.author | Lau, Kei-May | en_US |
dc.contributor.author | Chen, Chyong-Hua | en_US |
dc.contributor.author | Lin, Chien-Chung | en_US |
dc.contributor.author | Kuo, Hao-Chung | en_US |
dc.date.accessioned | 2018-08-21T05:52:39Z | - |
dc.date.available | 2018-08-21T05:52:39Z | - |
dc.date.issued | 2017-10-01 | en_US |
dc.identifier.issn | 2327-9125 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1364/PRJ.5.000411 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/143848 | - |
dc.description.abstract | In this study, a full-color emission red-green-blue (RGB) quantum-dot (QD)-based micro-light-emitting-diode (micro-LED) array with the reduced optical cross-talk effect by a photoresist mold has been demonstrated. The UV micro-LED array is used as an efficient excitation source for the QDs. The aerosol jet technique provides a narrow linewidth on the micrometer scale for a precise jet of QDs on the micro-LEDs. To reduce the optical cross-talk effect, a simple lithography method and photoresist are used to fabricate the mold, which consists of a window for QD jetting and a blocking wall for cross-talk reduction. The cross-talk effect of the well-confined QDs in the window is confirmed by a fluorescence microscope, which shows clear separation between QD pixels. A distributed Bragg reflector is covered on the micro-LED array and the QDs' jetted mold to further increase the reuse of UV light. The enhanced light emission of the QDs is 5%, 32%, and 23% for blue, green, and red QDs, respectively. (C) 2017 Chinese Laser Press | en_US |
dc.language.iso | en_US | en_US |
dc.title | Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1364/PRJ.5.000411 | en_US |
dc.identifier.journal | PHOTONICS RESEARCH | en_US |
dc.citation.volume | 5 | en_US |
dc.citation.spage | 411 | en_US |
dc.citation.epage | 416 | en_US |
dc.contributor.department | 光電系統研究所 | zh_TW |
dc.contributor.department | 應用化學系 | zh_TW |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Institute of Photonic System | en_US |
dc.contributor.department | Department of Applied Chemistry | en_US |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000412011400005 | en_US |
顯示於類別: | 期刊論文 |