Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Tsai, Yi-Chia | en_US |
dc.contributor.author | Li, Yiming | en_US |
dc.contributor.author | Samukawa, Seiji | en_US |
dc.date.accessioned | 2018-08-21T05:52:52Z | - |
dc.date.available | 2018-08-21T05:52:52Z | - |
dc.date.issued | 2017-12-01 | en_US |
dc.identifier.issn | 0957-4484 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1088/1361-6528/aa90f1 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/144040 | - |
dc.description.abstract | In this work, we numerically simulate the silicon (Si)/silicon carbide (SiC) quantum dot superlattice solar cell (SiC-QDSL) with aluminum oxide (Al2O3-QDSL) passivation. By exploiting the passivation layer of Al2O3, the high photocurrent and the conversion efficiency can be achieved without losing the effective bandgap. Based on the two-photon transition mechanism in an AM1.5 and a one sun illumination, the simulated short-circuit current (J(sc)) of 4.77 mA cm(-2) is very close to the experimentally measured 4.75 mA cm(-2), which is higher than those of conventional SiC-QDSLs. Moreover, the efficiency fluctuation caused by the structural variation is less sensitive by using the passivation layer. A high conversion efficiency of 17.4% is thus estimated by adopting the QD's geometry used in the experiment; and, it can be further boosted by applying a hexagonal QD formation with an inter-dot spacing of 0.3 nm. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | quantum dot | en_US |
dc.subject | superlattice | en_US |
dc.subject | solar cells | en_US |
dc.subject | Si/SiC | en_US |
dc.subject | physical characteristic | en_US |
dc.subject | electrical characteristic | en_US |
dc.subject | minibands | en_US |
dc.title | Physical and electrical characteristics of Si/SiC quantum dot superlattice solar cells with passivation layer of aluminum oxide | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/1361-6528/aa90f1 | en_US |
dc.identifier.journal | NANOTECHNOLOGY | en_US |
dc.citation.volume | 28 | en_US |
dc.contributor.department | 資訊工程學系 | zh_TW |
dc.contributor.department | 電信工程研究所 | zh_TW |
dc.contributor.department | Department of Computer Science | en_US |
dc.contributor.department | Institute of Communications Engineering | en_US |
dc.identifier.wosnumber | WOS:000414553500001 | en_US |
Appears in Collections: | Articles |