標題: Effect of Sn Grain Orientation on Formation of Cu6Sn5 Intermetallic Compound Under Current Stressing
作者: Chen, Ming-Yao
Lin, Han-wen
Chen, Chih
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Electromigration;solder joints;preferred orientation;intermetallic compounds
公開日期: 1-四月-2017
摘要: Solder joints with Cu/Sn-Ag/Cu structure and bump height of 15 mu m have been used to investigate the electromigration phenomenon at different temperatures and current densities. Moreover, the grain orientation was analyzed using electron backscatter diffraction. It was found that the anisotropic properties of tin affected the formation rate of Cu-Sn intermetallic compounds (IMCs), and that the angle between the electron flow direction and tin grain orientation played an important role in the formation of Cu6Sn5 IMC. With changes in angle, the diffusion rate of copper atoms in tin also varied. When the c-axis of tin was parallel to the electron flux, copper atoms diffused rapidly, resulting in fast formation of Cu-Sn IMCs. On the other hand, if the angle between the c-axis of the grain and the electron flow direction was large, the tin grains were more resistant to Cu diffusion during current stressing, leading to a very slow IMC formation rate.
URI: http://dx.doi.org/10.1007/s11664-016-5154-5
http://hdl.handle.net/11536/144098
ISSN: 0361-5235
DOI: 10.1007/s11664-016-5154-5
期刊: JOURNAL OF ELECTRONIC MATERIALS
Volume: 46
起始頁: 2179
結束頁: 2184
顯示於類別:期刊論文