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dc.contributor.authorChen, Ming-Yaoen_US
dc.contributor.authorLin, Han-wenen_US
dc.contributor.authorChen, Chihen_US
dc.date.accessioned2018-08-21T05:52:55Z-
dc.date.available2018-08-21T05:52:55Z-
dc.date.issued2017-04-01en_US
dc.identifier.issn0361-5235en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s11664-016-5154-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/144098-
dc.description.abstractSolder joints with Cu/Sn-Ag/Cu structure and bump height of 15 mu m have been used to investigate the electromigration phenomenon at different temperatures and current densities. Moreover, the grain orientation was analyzed using electron backscatter diffraction. It was found that the anisotropic properties of tin affected the formation rate of Cu-Sn intermetallic compounds (IMCs), and that the angle between the electron flow direction and tin grain orientation played an important role in the formation of Cu6Sn5 IMC. With changes in angle, the diffusion rate of copper atoms in tin also varied. When the c-axis of tin was parallel to the electron flux, copper atoms diffused rapidly, resulting in fast formation of Cu-Sn IMCs. On the other hand, if the angle between the c-axis of the grain and the electron flow direction was large, the tin grains were more resistant to Cu diffusion during current stressing, leading to a very slow IMC formation rate.en_US
dc.language.isoen_USen_US
dc.subjectElectromigrationen_US
dc.subjectsolder jointsen_US
dc.subjectpreferred orientationen_US
dc.subjectintermetallic compoundsen_US
dc.titleEffect of Sn Grain Orientation on Formation of Cu6Sn5 Intermetallic Compound Under Current Stressingen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s11664-016-5154-5en_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.citation.volume46en_US
dc.citation.spage2179en_US
dc.citation.epage2184en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000395454400034en_US
Appears in Collections:Articles