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dc.contributor.authorChen, Hsuan-Anen_US
dc.contributor.authorChen, Wei-Chanen_US
dc.contributor.authorSun, Hsuen_US
dc.contributor.authorLin, Chien-Chungen_US
dc.contributor.authorLin, Shih-Yenen_US
dc.date.accessioned2018-08-21T05:53:12Z-
dc.date.available2018-08-21T05:53:12Z-
dc.date.issued2018-02-01en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttp://dx.doi.org/10.1088/1361-6641/aaa3b7en_US
dc.identifier.urihttp://hdl.handle.net/11536/144385-
dc.description.abstractBi-layer graphene is grown directly on sapphire substrates by using ethane as the precursor without the assistance of a metal catalyst. A growth model of graphene flake formation in the furnace, followed by a complete film growth is also proposed. Using the graphene/sapphire sample as the new substrate, scalable MoS2 films with good layer number controllability can be grown directly on the substrate. After fabricating the MoS2/graphene hetero-structures into bottom-gate photo-transistors, a Dirac point shift is observed for the device under the light irradiation condition, which is attributed to the extraction of photo-excited electrons in the MoS2 layer to the graphene channel. The photo-voltaic response observed for the photo-transistors may provide a potential application of the 2D material hetero-structure in thin-film solar cells.en_US
dc.language.isoen_USen_US
dc.subject2D material hetero-structuresen_US
dc.subjectvan der Waals epitaxyen_US
dc.subjectphoto-transistorsen_US
dc.titleScalable MoS2/graphene hetero-structures grown epitaxially on sapphire substrates for phototransistor applicationsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/1361-6641/aaa3b7en_US
dc.identifier.journalSEMICONDUCTOR SCIENCE AND TECHNOLOGYen_US
dc.citation.volume33en_US
dc.contributor.department影像與生醫光電研究所zh_TW
dc.contributor.departmentInstitute of Imaging and Biomedical Photonicsen_US
dc.identifier.wosnumberWOS:000422871500001en_US
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