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dc.contributor.authorMirmotallebi, Monaen_US
dc.contributor.authorZad, Azam Irajien_US
dc.contributor.authorHosseini, Zahra Sadaten_US
dc.contributor.authorJokar, Effaten_US
dc.date.accessioned2018-08-21T05:53:19Z-
dc.date.available2018-08-21T05:53:19Z-
dc.date.issued2018-04-05en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2018.01.041en_US
dc.identifier.urihttp://hdl.handle.net/11536/144548-
dc.description.abstractThree-dimensional reduced graphene oxide (3D-rGO) structures decorated with CuO particles (GCu) are synthesized through a simple and scalable method for detection of hydrogen sulfide (H2S) gas. For characterization and investigation of porous structure various techniques were employed. Decorated 3D structures demonstrated higher sensitivity and selectivity in comparison to pure structure. Optimized structure for sensing was obtained through introducing different amounts of CuO. The GCu heterostructures containing 35 mu mol of CuO powder demonstrated reproducible response of about 30% to the concentration of 10 ppm at room temperature, while complete recovery was obtained through heating to 150 degrees C. Sensing behaviour of the samples to H2S gas was investigated at temperatures in the range of 25-150 degrees C and in different relative humidity levels from 3 to 80%. We discussed the sensing model based on the adsorption of H2S molecules on the additives, and electron injection to the sample, resulting in the electrical resistance enhancement. (C) 2018 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectThree-dimensional structureen_US
dc.subjectGrapheneen_US
dc.subjectCopper oxideen_US
dc.subjectHydrogen sulfideen_US
dc.subjectGas sensingen_US
dc.titleCharacterization of three-dimensional reduced graphene oxide/copper oxide heterostructures for hydrogen sulfide gas sensing applicationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jallcom.2018.01.041en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume740en_US
dc.citation.spage1024en_US
dc.citation.epage1031en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000425494200120en_US
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