完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWu, C. H.en_US
dc.contributor.authorWu, P. W.en_US
dc.contributor.authorChen, J. H.en_US
dc.contributor.authorKao, J. Y.en_US
dc.contributor.authorHsu, C. Y.en_US
dc.date.accessioned2018-08-21T05:53:22Z-
dc.date.available2018-08-21T05:53:22Z-
dc.date.issued2018-07-01en_US
dc.identifier.issn1533-4880en_US
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2018.15279en_US
dc.identifier.urihttp://hdl.handle.net/11536/144593-
dc.description.abstractCu(In, Ga)Se-2 (CIGS) films were fabricated by a two-step process method using sputtering from Cu0.7Ga0.3 and In targets. The metallic precursor structures of In/CuGa/In were prepared, and CuGa film was adjusted to the thicknesses of 150, 200, 250 and 300 nm, in order to optimize the CIGS film. After selenization, three independent CIGS (112), CIGS (220/204) and CIGS (312/116) began to crystallize at similar to 280 degrees C and phase peaks continued growing until 560 degrees C. Experimental results showed that with a single stage selenization method, the excessive stoichiometry of the CIGS films was obtained. Using three sequential stages for the selenization process, with a annealing time of 20 min, the stoichiometry of the CIGS absorbers with the Cu/(In + Ga) and Ga/(In + Ga) showed atomic ratios of 0.94 and 0.34, respectively. The intensity of the (112) XRD diffraction peak became stronger, indicating an improvement in the crystallinity. Raman spectra of CIGS absorbers showed a main peak (174 cm(-1)) and two weak signals (212 and 231 cm(-1)). TEM image for electron diffraction pattern showed that the grains were randomly oriented. CIGS solar cell device prepared with a proper selenization, a maximum efficiency of 12.45% was obtained.en_US
dc.language.isoen_USen_US
dc.subjectCIGSen_US
dc.subjectSelenizationen_US
dc.subjectAnnealing Timeen_US
dc.subjectTEMen_US
dc.titleEffect of Selenization Processes on CIGS Solar Cell Performanceen_US
dc.typeArticleen_US
dc.identifier.doi10.1166/jnn.2018.15279en_US
dc.identifier.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGYen_US
dc.citation.volume18en_US
dc.citation.spage5074en_US
dc.citation.epage5081en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000426057800079en_US
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