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dc.contributor.authorHuang, Bo-Chaoen_US
dc.contributor.authorYu, Puen_US
dc.contributor.authorChu, Y. H.en_US
dc.contributor.authorChang, Chia-Sengen_US
dc.contributor.authorRamesh, Ramamoorthyen_US
dc.contributor.authorDunin-Borkowski, Rafal E.en_US
dc.contributor.authorEbert, Philippen_US
dc.contributor.authorChiu, Ya-Pingen_US
dc.date.accessioned2018-08-21T05:53:23Z-
dc.date.available2018-08-21T05:53:23Z-
dc.date.issued2018-02-01en_US
dc.identifier.issn1936-0851en_US
dc.identifier.urihttp://dx.doi.org/10.1021/acsnano.7b06004en_US
dc.identifier.urihttp://hdl.handle.net/11536/144629-
dc.description.abstractWe map electronic states, band gaps, and interface-bound charges at termination-engineered BiFeO3/La0.7Sr0.3MnO3 interfaces using atomically resolved cross-sectional scanning tunneling microscopy. We identify a delicate interplay of different correlated physical effects and relate these to the ferroelectric and magnetic interface properties tuned by engineering the atomic layer stacking sequence at the interfaces. This study highlights the importance of a direct atomically resolved access to electronic interface states for understanding the intriguing interface properties in complex oxides.en_US
dc.language.isoen_USen_US
dc.subjectcomplex oxide heterointerfacesen_US
dc.subjectBiFeO3en_US
dc.subjectLa0.7Sr0.3MnO3en_US
dc.subjectcross-sectional scanning tunneling microscopyen_US
dc.subjectatomically resolved electronic statesen_US
dc.titleAtomically Resolved Electronic States and Correlated Magnetic Order at Termination Engineered Complex Oxide Heterointerfacesen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/acsnano.7b06004en_US
dc.identifier.journalACS NANOen_US
dc.citation.volume12en_US
dc.citation.spage1089en_US
dc.citation.epage1095en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000426615600020en_US
Appears in Collections:Articles