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dc.contributor.authorHsu, Chung-Chunen_US
dc.contributor.authorLin, Kun-Linen_US
dc.contributor.authorChi, Wei-Chunen_US
dc.contributor.authorChou, Chen-Hanen_US
dc.contributor.authorLuo, Guang-Lien_US
dc.contributor.authorLee, Yao-Jenen_US
dc.contributor.authorChien, Chao-Hsinen_US
dc.date.accessioned2018-08-21T05:53:26Z-
dc.date.available2018-08-21T05:53:26Z-
dc.date.issued2018-04-30en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2018.01.119en_US
dc.identifier.urihttp://hdl.handle.net/11536/144687-
dc.description.abstractDuring the formation of distinct bilayer NiGePt alloy, a phase-separation phenomenon was observed using microwave annealing and structural engineering. The microstructures of bilayer NiGePt [PtGe(Ni)-NiGe(Pt)] alloys fabricated with 10-nm Ni and various thicknesses of Pt (5, 10, and 15 nm) were characterized. Within the same thermal budget as microwave annealing, the diffusion of Ni exhibited stronger alloy formation ability with Ge and drilled through the Pt layer without resistance. The higher diffusivity of Ni atoms dominated the diffusion of Ni through the Pt layer to form a stable crystalline layer, NiGe(Pt). Ge diffused outwardly toward the Pt layer to form a PtGe(Ni) layer. This special phenomenon of bilayer alloy formation was elucidated using nanobeam electron diffraction by transmission electron microscopy in conjunction with energy-dispersive spectrometry. Comparing the differences in metal alloys between microwave and rapid thermal annealing, microwave annealing formed a bilayer alloy more apparently than rapid thermal annealing. The results and electrical characteristics indicated that a thicker Pt layer for forming a bilayer NiGePt alloy with alloy separation could also effectively improve the leakage current of NiGePt [PtGe(Ni)- NiGe(Pt)]/n-Ge Schottky junctions. (c) 2018 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectMicrowave-activated annealingen_US
dc.subjectNiGePten_US
dc.subjectPhase-separation alloyen_US
dc.subjectSchottky junctionen_US
dc.titlePhase-separation phenomenon of NiGePt alloy on n-Ge by microwave annealingen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jallcom.2018.01.119en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume743en_US
dc.citation.spage262en_US
dc.citation.epage267en_US
dc.contributor.department電機學院zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000427511200031en_US
Appears in Collections:Articles