完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Fu, Ruofan | en_US |
dc.contributor.author | Yang, Jianwen | en_US |
dc.contributor.author | Chang, Wei-Chiao | en_US |
dc.contributor.author | Chang, Wei-Cheng | en_US |
dc.contributor.author | Chang, Chien-Min | en_US |
dc.contributor.author | Lin, Dong | en_US |
dc.contributor.author | Zhang, Qun | en_US |
dc.contributor.author | Liu, Po-Tsun | en_US |
dc.contributor.author | Shieh, Han-Ping D. | en_US |
dc.date.accessioned | 2018-08-21T05:53:28Z | - |
dc.date.available | 2018-08-21T05:53:28Z | - |
dc.date.issued | 2018-03-21 | en_US |
dc.identifier.issn | 1862-6300 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1002/pssa.201700785 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/144729 | - |
dc.description.abstract | In this paper, the influence of annealing temperature on amorphous indium-zinc-tungsten-oxide (a-IZWO) thin-film transistors (TFTs) is investigated. As the annealing temperature increases, the IZWO films maintain an amorphous state, which is conducive to the uniformity of the TFT. The field effect mobility of the device increases as a function of annealing temperature and reaches 16.2cm(2)V(-1)s(-1) at 300 degrees C, along with an on/off current ratio of 1.6x10(8). Meanwhile, the corresponding positive bias stability is improved, as confirmed by the fact that the threshold voltage shift value reduces to 0.4V after being stressed for 1500s. This result can be ascribed to the decrease in electrons captured by the deep defects in a-IZWO TFTs. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | annealing | en_US |
dc.subject | indium-zinc-tungsten-oxide | en_US |
dc.subject | positive bias stress | en_US |
dc.subject | thin-film transistors | en_US |
dc.title | The Influence of Annealing Temperature on Amorphous Indium-Zinc-Tungsten Oxide Thin-Film Transistors | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1002/pssa.201700785 | en_US |
dc.identifier.journal | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | en_US |
dc.citation.volume | 215 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000428341000012 | en_US |
顯示於類別: | 期刊論文 |