Full metadata record
DC FieldValueLanguage
dc.contributor.authorSa Hoang Huynhen_US
dc.contributor.authorMinh Thien Huu Haen_US
dc.contributor.authorHuy Binh Doen_US
dc.contributor.authorTuan Anh Nguyenen_US
dc.contributor.authorQuang Ho Lucen_US
dc.contributor.authorChang, Edward Yien_US
dc.date.accessioned2018-08-21T05:53:29Z-
dc.date.available2018-08-21T05:53:29Z-
dc.date.issued2018-04-01en_US
dc.identifier.issn1882-0778en_US
dc.identifier.urihttp://dx.doi.org/10.7567/APEX.11.045503en_US
dc.identifier.urihttp://hdl.handle.net/11536/144763-
dc.description.abstractThe configuration of the interfacial misfit array at InxGa1-xSb/GaAs interfaces with different indium compositions and thicknesses grown by metalorganic chemical vapor deposition was systematically analyzed using X-ray diffraction (XRD) reciprocal space maps (RSMs). These analyses confirmed that the epilayer relaxation was mainly contributed to by the high degree of spatial correlation of the 90 degrees misfit array (correlation factors <0.01). The anisotropic peak-broadening aspect ratio was found to have a non-linear composition dependence as well as be thickness-dependent, related to the strain relaxation of the epilayer. However, the peak-broadening behavior in each RSM scan direction had different composition and thickness dependences. (c) 2018 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleNonlinear dependence of X-ray diffraction peak broadening in InxGa1-xSb epitaxial layers on GaAs substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/APEX.11.045503en_US
dc.identifier.journalAPPLIED PHYSICS EXPRESSen_US
dc.citation.volume11en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department國際半導體學院zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentInternational College of Semiconductor Technologyen_US
dc.identifier.wosnumberWOS:000428772300001en_US
Appears in Collections:Articles