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dc.contributor.authorChang, Che-Chiaen_US
dc.contributor.authorLiu, Po-Tsunen_US
dc.contributor.authorChien, Chen-Yuen_US
dc.contributor.authorFan, Yang-Shunen_US
dc.date.accessioned2018-08-21T05:53:37Z-
dc.date.available2018-08-21T05:53:37Z-
dc.date.issued2018-04-23en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5020583en_US
dc.identifier.urihttp://hdl.handle.net/11536/144924-
dc.description.abstractThis study demonstrates the integration of a thin film transistor (TFT) and resistive random-access memory (RRAM) to form a one-transistor-one-resistor (1T1R) configuration. With the concept of the current conducting direction in RRAM and TFT, a triple-layer stack design of Pt/InGaZnO/Al2O3 is proposed for both the switching layer of RRAM and the channel layer of TFT. This proposal decreases the complexity of fabrication and the numbers of photomasks required. Also, the robust endurance and stable retention characteristics are exhibited by the 1T1R architecture for promising applications in memory-embedded flat panel displays. Published by AIP Publishing.en_US
dc.language.isoen_USen_US
dc.titleSolving the integration problem of one transistor one memristor architecture with a Bi-layer IGZO film through synchronous processen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.5020583en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume112en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000431072800026en_US
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