完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWu, Cheng-Hanen_US
dc.contributor.authorWu, Pu-Weien_US
dc.contributor.authorHsiao, Ruey-Changen_US
dc.contributor.authorHsu, Chun-Yaoen_US
dc.date.accessioned2018-08-21T05:53:47Z-
dc.date.available2018-08-21T05:53:47Z-
dc.date.issued2018-07-01en_US
dc.identifier.issn0957-4522en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s10854-018-9235-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/145150-
dc.description.abstractThis study produces high quality Cu(In,Ga)Se-2 (CIGS) solar cells using a two-step process. Stacked In (200 nm)/CuGa (150 similar to 300 nm)/In (500 nm) layers are deposited onto Mo bilayer soda-lime glass by sputtering, using CuGa and In targets, followed by vapor stacking of the elemental Se layers. To produce the CIGS film, the CuGa film is coated in thicknesses of 150, 200, 250 and 300 nm. An appropriate atomic ratio [Cu/(In + Ga), CGI and Ga/(In + Ga), GGI] for the precursors and the CIGS absorption layers composition is easily obtained. Compared to those for the as-deposited precursors, after selenization, the CGI and GGI ratios for CIGS films are almost constant. All CIGS thin films exhibit a peak in the Raman curves at around 173-174 cm(-1), which is identified as the CIGS phase. Following sulfurization, the main peaks for CIGS thin films at (112), (220)/(204) and (312)/(116) indicated that the crystalline quaility were improved. The main peaks for the CIGSS films are slightly greater for (112), (220)/(204) and (312)/(116). The band gap energy is increased from 1.19 eV (for the as-grown) to 1.34 eV (for the absorber layer that is sulfurized at 500 A degrees C for 10 min). The performance of the CIGS absorber films is improved by using a proper holding time for sulfurization.en_US
dc.language.isoen_USen_US
dc.titleGrowth and characterization of high quality CIGS films using novel precursors stacked and surface sulfurization processen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s10854-018-9235-5en_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICSen_US
dc.citation.volume29en_US
dc.citation.spage11429en_US
dc.citation.epage11438en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000435588600078en_US
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