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dc.contributor.authorVolodin, V. A.en_US
dc.contributor.authorGritsenko, V. A.en_US
dc.contributor.authorChin, A.en_US
dc.date.accessioned2018-08-21T05:53:48Z-
dc.date.available2018-08-21T05:53:48Z-
dc.date.issued2018-05-01en_US
dc.identifier.issn1063-7850en_US
dc.identifier.urihttp://dx.doi.org/10.1134/S1063785018050279en_US
dc.identifier.urihttp://hdl.handle.net/11536/145168-
dc.description.abstractRaman spectra of films of nearly stoichiometric amorphous silicon nitride (a-Si3N4) reveal a contribution due to local oscillations of silicon-silicon (Si-Si) bonds. This observation directly confirms that the almost stoichiometric a-Si3N4 contains Si-Si bonds, which, according to theoretical predictions, act as electron and hole traps that are responsible for the memory effect in Si3N4.en_US
dc.language.isoen_USen_US
dc.titleLocal Oscillations of Silicon-Silicon Bonds in Silicon Nitrideen_US
dc.typeArticleen_US
dc.identifier.doi10.1134/S1063785018050279en_US
dc.identifier.journalTECHNICAL PHYSICS LETTERSen_US
dc.citation.volume44en_US
dc.citation.spage424en_US
dc.citation.epage427en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000435980200017en_US
Appears in Collections:Articles