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dc.contributor.authorPeng, An-Samen_US
dc.contributor.authorWu, Lin-Kunen_US
dc.date.accessioned2019-04-03T06:44:34Z-
dc.date.available2019-04-03T06:44:34Z-
dc.date.issued2017-05-01en_US
dc.identifier.issn1745-1353en_US
dc.identifier.urihttp://dx.doi.org/10.1587/transele.E100.C.424en_US
dc.identifier.urihttp://hdl.handle.net/11536/145466-
dc.description.abstractIn this paper, an accurate experimental noise model to improve the EEHEMT nonlinear model using the Verilog-A language in Agilent ADS is presented for the first time. The present EEHEMT model adopts channel noise to model the noise behavior of pseudomorphic high electron mobility transistor (pHEMT). To enhance the accuracy of the EEHEMT noise model, we add two extra noise sources: gate shot noise and induced gate noise current. Here we demonstrate the power spectral density of the channel noise S-id and gate noise S-ig versus gate-source voltage for 0.25 mu m pHEMT devices. Additionally, the related noise source parameters, i.e., P, R, and C are presented. Finally, we compare four noise parameters between the simulation and model, and the agreement between the measurement and simulation results shows that this proposed approach is dependable and accurate.en_US
dc.language.isoen_USen_US
dc.subjectpHEMTen_US
dc.subjectnoise parametersen_US
dc.subjectmodelingen_US
dc.subjectEEHEMTen_US
dc.titleAn Improved EEHEMT RF Noise Model for 0.25 mu m InGaP pHEMT Transistor Using Verilog-A Languageen_US
dc.typeArticleen_US
dc.identifier.doi10.1587/transele.E100.C.424en_US
dc.identifier.journalIEICE TRANSACTIONS ON ELECTRONICSen_US
dc.citation.volumeE100Cen_US
dc.citation.issue5en_US
dc.citation.spage424en_US
dc.citation.epage429en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000400678600003en_US
dc.citation.woscount0en_US
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