完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLiu, H. -W.en_US
dc.contributor.authorChan, P. -C.en_US
dc.contributor.authorLin, J. -H.en_US
dc.contributor.authorChang, C. -Y.en_US
dc.contributor.authorTai, Y. -H.en_US
dc.date.accessioned2018-08-21T05:54:15Z-
dc.date.available2018-08-21T05:54:15Z-
dc.date.issued2017-07-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2017.2705701en_US
dc.identifier.urihttp://hdl.handle.net/11536/145718-
dc.description.abstractIn this letter, the response in the drain current (I-D) of the amorphous indium-gallium-zinc oxide thin-film transistors under positive-bias illumination stress is measured with respect to time in less than 5 s under light pulseswith altering frequencies and duty ratios. The curves of I-D under the light pulses are affected by the different defect-reacting rates under illumination and in the dark. By taking the derivative of ID, the trend of the change in the number of defects becomes clear. The total behavior of I-D in response to light pulses can be fairly predicted by the integral of the derivative terms with a correction factor of charge trapping.en_US
dc.language.isoen_USen_US
dc.subjectAmorphous indium gallium zinc oxide (a-IGZO)en_US
dc.subjectthin-film transistor (TFT)en_US
dc.subjectillumination effecten_US
dc.titleAnalysis of the Short-Term Response in the Drain Current of a-IGZO TFT to Light Pulsesen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2017.2705701en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume38en_US
dc.citation.spage887en_US
dc.citation.epage889en_US
dc.contributor.department電機學院zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000404349000015en_US
顯示於類別:期刊論文