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dc.contributor.authorWang, Kuang-Yuen_US
dc.contributor.authorChiu, Yu-Kaien_US
dc.contributor.authorCheng, Huang-Chungen_US
dc.date.accessioned2018-08-21T05:54:15Z-
dc.date.available2018-08-21T05:54:15Z-
dc.date.issued2017-01-01en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://dx.doi.org/10.1149/2.1251707jesen_US
dc.identifier.urihttp://hdl.handle.net/11536/145727-
dc.description.abstractA electrochemical capacitor (EC) composed of horizontally aligned carbon nanotube (HACNT) electrodes treated with oxygen plasma has been successfully shown to achieve superior specific capacitance. Cyclic voltammetry (CV) measurement reveals that the HACNT thin films on the Si substrate modified by the oxygen plasma with a bias power of 60 W obtain the highest specific capacitance of 6.81 mF/cm(2), which is 5.6 times that of non-plasma-treated ones. Such improvement can be attributed to the increase of oxygen-containing functional groups, such as C-OH, C=O, and COOH as well as to structural defects which remarkably increase the extra redox reactions to enhance the specific capacitance. The electrochemical stabilities of the oxygen-plasma-treated (OPT) HACNT thin films were also verified. Finally, the OPT HACNT thin films were transferred to the flexible PET thin foil and still achieved characteristics similar to those on the hard Si substrate. Even after a bending test of 200 bends with a bending radius of 1 cm and bending angle of 90 degrees, the variation of specific capacitance is less than 3% for such flexible ECs. The electrochemical stability of the OPT HACNT thin films after mechanical bending is equal to that of the Si substrate. This shows that such OPT HACNT ECs have promise for the future flexible applications in the energy storage field. (C) The Author(s) 2017. Published by ECS. All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleElectrochemical Capacitors of Horizontally Aligned Carbon Nanotube Electrodes with Oxygen Plasma Treatmenten_US
dc.typeArticleen_US
dc.identifier.doi10.1149/2.1251707jesen_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume164en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000404397300032en_US
Appears in Collections:Articles