標題: Device Instability of ReRAM and a Novel Reference Cell Design for Wide Temperature Range Operation
作者: Lin, Y. H.
Lin, Y. Y.
Lee, F. M.
Ho, Y. H.
Hsu, K. C.
Lee, M. H.
Lee, D. Y.
Chiang, K. H.
Yang, C. C.
Li, C. H.
Wu, S. W.
Lei, C. Y.
Lin, C. M.
Chen, C. J.
Chen, K. H.
Lung, H. L.
Wang, K. C.
Tseng, T. Y.
Lu, C. Y.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Resistive random access memory;transition metal oxide;noise;stability;temperature dependency
公開日期: 1-九月-2017
摘要: This letter addresses two difficult challenges for transition metal oxide resistive random access memories (ReRAMs)-sensitivity to operation temperature and random fluctuation of resistance value. A careful study of a WOx ReRAM array reveals that these devices are unstable and their read currents fluctuate with time due to random telegraph noise and structure relaxation. Consequently, even after careful programming, the current distribution can broaden with time and tail bit population grows. Furthermore, ReRAM state is sensitive to temperature and a reference cell made of the same device material must be used. Thus, although the broadening of read current distribution may be tolerated by creating a larger RESET/SET memory window, the current fluctuation still makes it impossible to predict the output of the reference cell, leading to array malfunction. This letter investigates the current (resistance) instability in detail and proposes a reference array with a novel trimming method that can stabilize the reference current level. The proposed reference array has very good dc stress reliability as well as wide-range temperature tracking performance from -40 degrees C to 85 degrees C.
URI: http://dx.doi.org/10.1109/LED.2017.2732025
http://hdl.handle.net/11536/145969
ISSN: 0741-3106
DOI: 10.1109/LED.2017.2732025
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 38
起始頁: 1224
結束頁: 1227
顯示於類別:期刊論文