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dc.contributor.authorChiu, Shao-Pinen_US
dc.contributor.authorYamanouchi, Michihikoen_US
dc.contributor.authorOyamada, Tatsuroen_US
dc.contributor.authorOhta, Hiromichien_US
dc.contributor.authorLin, Juhn-Jongen_US
dc.date.accessioned2019-04-03T06:43:59Z-
dc.date.available2019-04-03T06:43:59Z-
dc.date.issued2017-08-28en_US
dc.identifier.issn2469-9950en_US
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevB.96.085143en_US
dc.identifier.urihttp://hdl.handle.net/11536/145978-
dc.description.abstractEpitaxial La2/3Sr1/3MnO3 (LSMO) films have been grown on SrTiO3 (001) substrates via pulsed laser deposition. In a 22-nm-thick LSMO film with a low residual resistivity of rho(0) approximate to 59 mu Omega cm, we found a zero-field dip in the magnetoresistance (MR) below 10 K, manifesting the weak antilocalization (WAL) effect due to strong spin-orbit coupling (SOC). We have analyzed the MR data by including the D'yakonov-Perel' spin-relaxation mechanism in the WAL theory. We explain that the delocalized spin-down electron sub-band states play a crucial role for facilitating marked SOC in clean LSMO. Moreover, we find that the SOC strength and gate voltage tunability are similar to those in a two-dimensional electron gas at the LaAlO3/SrTiO3 interface, indicating the presence of an internal electric field near the LSMO/SrTiO3 interface. In a control measurement on a 5-nm-thick high resistivity (rho(0) approximate to 280 mu Omega cm) LSMO film, we observe only a small zero-field peak in MR from weak localization effect, indicating negligible SOC.en_US
dc.language.isoen_USen_US
dc.titleGate tunable spin-orbit coupling and weak antilocalization effect in an epitaxial La2/3Sr1/3MnO3 thin filmen_US
dc.typeArticleen_US
dc.identifier.doi10.1103/PhysRevB.96.085143en_US
dc.identifier.journalPHYSICAL REVIEW Ben_US
dc.citation.volume96en_US
dc.citation.issue8en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000408512400006en_US
dc.citation.woscount2en_US
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