標題: Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering
作者: Kruchinin, V. N.
Perevalov, T. V.
Atuchin, V. V.
Gritsenko, V. A.
Komonov, A. I.
Korolkov, I. V.
Pokrovsky, L. D.
Shih, Cheng Wei
Chin, Albert
交大名義發表
National Chiao Tung University
關鍵字: TiO2;film;RHEED;AFM;spectroscopic ellipsometry;optical constant
公開日期: 1-十月-2017
摘要: Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high- energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc-Lorentz model by SE in the photon energy range of E = 1.12-4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of E (g) ae 3.44 eV.
URI: http://dx.doi.org/10.1007/s11664-017-5552-3
http://hdl.handle.net/11536/146003
ISSN: 0361-5235
DOI: 10.1007/s11664-017-5552-3
期刊: JOURNAL OF ELECTRONIC MATERIALS
Volume: 46
起始頁: 6089
結束頁: 6095
顯示於類別:期刊論文