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dc.contributor.authorKumar, D.en_US
dc.contributor.authorAluguri, R.en_US
dc.contributor.authorChand, U.en_US
dc.contributor.authorTseng, T. Y.en_US
dc.date.accessioned2018-08-21T05:54:29Z-
dc.date.available2018-08-21T05:54:29Z-
dc.date.issued2017-01-01en_US
dc.identifier.issn0272-8842en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.ceramint.2017.05.289en_US
dc.identifier.urihttp://hdl.handle.net/11536/146024-
dc.description.abstractWith the continuously changing landscape of the computer technologies, a new memory type is needed that will be fast, energy efficient and long-lasting. It shall combine the speed of random access memory (RAM) and nonvolatile in the same time. Resistive RAM (RRAM) is one of the most promising candidates in this respect. RRAM has attracted a great deal of attention owing to its potential as a possible replacement for flash memory in next-generation nonvolatile memory (NVM) applications. A brief summary of binary metal oxide RRAM is given in this review. We discuss the RRAM technology development based on published papers, including the mechanism of resistive switching in transition metal oxides, resistive switching materials, device structure, properties, and reliability such as endurance and retention of the device. We also provide possible solutions through innovations in device materials, structures, and understanding the device physics.en_US
dc.language.isoen_USen_US
dc.subjectREAMen_US
dc.subjectConduction mechanismen_US
dc.titleMetal oxide resistive switching memory: Materials, properties and switching mechanismsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.ceramint.2017.05.289en_US
dc.identifier.journalCERAMICS INTERNATIONALen_US
dc.citation.volume43en_US
dc.citation.issue1en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000409285800098en_US
Appears in Collections:Articles