完整後設資料紀錄
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dc.contributor.authorZhuravlev, K. S.en_US
dc.contributor.authorGulyaev, D. V.en_US
dc.contributor.authorAleksandrov, I. A.en_US
dc.contributor.authorMalin, T. V.en_US
dc.contributor.authorMansurov, V. G.en_US
dc.contributor.authorGalitsyn, Yu G.en_US
dc.contributor.authorKonfederatova, K. A.en_US
dc.contributor.authorChen, Yen-Chunen_US
dc.contributor.authorChang, Wen-Haoen_US
dc.date.accessioned2019-04-03T06:48:01Z-
dc.date.available2019-04-03T06:48:01Z-
dc.date.issued2017-01-01en_US
dc.identifier.issn1742-6588en_US
dc.identifier.urihttp://dx.doi.org/10.1088/1742-6596/864/1/012007en_US
dc.identifier.urihttp://hdl.handle.net/11536/146240-
dc.description.abstractWe report original method of formation Ga(In)N/AlN quantum dots with low density by ammonia MBE on the (0001)AlN surface by using a decomposition process of Ga(In)N thin layer. Low density of quantum dots have been obtained in the range 10(7)-10(9) cm(-2). Single quantum dots photoluminescence lines corresponding to exciton and biexciton transitions were observed in micro-photoluminescence spectra.en_US
dc.language.isoen_USen_US
dc.titleOriginal method of GaN and InGaN quantum dots formation on (0001)AlN surface by ammonia molecular beam epitaxyen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1088/1742-6596/864/1/012007en_US
dc.identifier.journal33RD INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORSen_US
dc.citation.volume864en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000437783500007en_US
dc.citation.woscount1en_US
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