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dc.contributor.authorYu, Hsin-Chiehen_US
dc.contributor.authorWang, Jyh-Shyangen_US
dc.contributor.authorSu, Yan-Kuinen_US
dc.contributor.authorChang, Shoou-Jinnen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorLai, Fang-, Ien_US
dc.contributor.authorChang, Y. H.en_US
dc.contributor.authorYang, Hong-Pin D.en_US
dc.date.accessioned2019-04-03T06:47:02Z-
dc.date.available2019-04-03T06:47:02Z-
dc.date.issued2007-01-01en_US
dc.identifier.isbn978-0-8194-6597-9en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.697732en_US
dc.identifier.urihttp://hdl.handle.net/11536/146444-
dc.description.abstractThe processing technology of 1.3 mu m InAs-InGaAs quantum-dot VCSELs with fully doped DBRs grown by MBE will be demonstrated. The threshold currents of the fabricated devices with 10 mu m oxide-confined aperture are 0.7mA, which correspond to 890A/cm(2) threshold current density. And the threshold voltage of the device is 1.03V and maximum output power is 33 M. The series resistance is 85 Omega which is 10 times lower then our preliminary work and 3 times lower then intracavity contacted InAs-InGaAs quantum-dot VCSEL. This relatively lower resistance can even comparable with the best result reported in InGaAs oxide-confined VCSELs with intracavity contact.en_US
dc.language.isoen_USen_US
dc.subject1.3 u muen_US
dc.subjectInAs-InGaAsen_US
dc.subjectquantum doten_US
dc.subjectVCSELen_US
dc.subjectfully doped DBRen_US
dc.subjectMBEen_US
dc.titleLow threshold current, low resistance 1.3 mu m InAs-InGaAs quantum-dot VCSELs with fully doped DBRs grown by MBEen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.697732en_US
dc.identifier.journalVERTICAL - CAVITY SURFACE - EMITTING LASERS XIen_US
dc.citation.volume6484en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000246390300012en_US
dc.citation.woscount0en_US
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