完整後設資料紀錄
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dc.contributor.authorYang, Yu-Taoen_US
dc.contributor.authorYu, Ting-Yangen_US
dc.contributor.authorKuo, Shu-Chiaoen_US
dc.contributor.authorHuang, Tai-Yuanen_US
dc.contributor.authorYang, Kai-Mingen_US
dc.contributor.authorKo, Cheng-Taen_US
dc.contributor.authorChen, Yu-Huaen_US
dc.contributor.authorTseng, Tzyy-Jangen_US
dc.contributor.authorChen, Kuan-Nengen_US
dc.date.accessioned2018-08-21T05:56:59Z-
dc.date.available2018-08-21T05:56:59Z-
dc.date.issued2017-01-01en_US
dc.identifier.issn0569-5503en_US
dc.identifier.urihttp://dx.doi.org/10.1109/ECTC.2017.9en_US
dc.identifier.urihttp://hdl.handle.net/11536/146896-
dc.description.abstractIn this paper, finite element method (FEM) simulations are carried out with pillar-concave structure using silicon substrate, silicon substrate with polyimide (PI) and with polybenzoxazole (PBO) for realization of Cu-Cu bonding at low temperature. Parameters of bonding temperature, pillar diameter, concave sidewall angle, and multilayer of concave structure are all considered in simulation. In addition, pillarconcave bonding is successfully demonstrated on silicon substrates with bonding temperatures ranging from 60 degrees C to 100 degrees C. Simulation and fabrication results of concept show potential impacts on current semiconductor packaging method with advantages such as high adhesive strength of polymer on various types of substrates, simplified manufacturing process, solder free interconnect and packaging process, Cu-Cu direct bonding at temperature lower than 100 degrees C, and high tolerance in surface roughness.en_US
dc.language.isoen_USen_US
dc.subjectsimulationen_US
dc.subjectCu-Cu direct bondingen_US
dc.subjecthetrogeneous integrationen_US
dc.titleBreakthrough in Cu to Cu Pillar-Concave Bonding on Silicon Substrate with Polymer Layer for Advanced Packaging, 3D, and Heterogeneous Integrationen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1109/ECTC.2017.9en_US
dc.identifier.journal2017 IEEE 67TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC 2017)en_US
dc.citation.spage637en_US
dc.citation.epage642en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000424702000093en_US
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