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dc.contributor.authorLin, G.en_US
dc.contributor.authorChang, C. Y.en_US
dc.contributor.authorTseng, W. C.en_US
dc.contributor.authorLee, C. P.en_US
dc.contributor.authorLin, K. F.en_US
dc.contributor.authorXuan, R.en_US
dc.contributor.authorChi, J. Y.en_US
dc.date.accessioned2018-08-21T05:57:00Z-
dc.date.available2018-08-21T05:57:00Z-
dc.date.issued2008-01-01en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.781955en_US
dc.identifier.urihttp://hdl.handle.net/11536/146922-
dc.description.abstractChirped multilayer (N=10) QD lasers with 2-, 3- and 5-layer of longer-, medium-, and shorter-wavelength QD stacks, respectively, were grown in this work. Low threshold current density and high saturated modal gain were achieved in this specially designed QD structure. Empirical gain-current analysis was performed on this chirped multilayer QD structure for the first time. It was consistent with our spectral observations and provided valuable information on carrier recombination in chirped multilayer QD structure. Two novel spectral characteristics were discovered also for the first time. First, simultaneous two-wavelength lasing around threshold was observed under particular gain-loss condition at this specific multilayer structure of QD stacking numbers. Second, at cryogenic temperature, simultaneous two-wavelength lasing emissions switched from longer-wavelength lasing first to shorter-wavelength lasing first with increasing current injection. Non-uniform carrier distribution among chirped multilayer QD structure is evident at low temperature below 200 K from our analysis.en_US
dc.language.isoen_USen_US
dc.subjectquantum dotsen_US
dc.subjectsemiconductor lasersen_US
dc.subjectmolecular beam epitaxyen_US
dc.subjectspectral characteristicsen_US
dc.subjecttemperature characteristicsen_US
dc.subjectgain-current characteristicsen_US
dc.subjectchirped multilayer QDsen_US
dc.subjectoptical coherent tomographyen_US
dc.titleNovel chirped multilayer quantum-dot lasersen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.781955en_US
dc.identifier.journalSEMICONDUCTOR LASERS AND LASER DYNAMICS IIIen_US
dc.citation.volume6997en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000258325400019en_US
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