完整後設資料紀錄
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dc.contributor.authorChen, C. H.en_US
dc.contributor.authorNiu, H.en_US
dc.contributor.authorHuang, R. T.en_US
dc.contributor.authorLee, C. P.en_US
dc.date.accessioned2019-04-02T06:00:48Z-
dc.date.available2019-04-02T06:00:48Z-
dc.date.issued2014-08-15en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2014.03.073en_US
dc.identifier.urihttp://hdl.handle.net/11536/147729-
dc.description.abstractWe show Ge microtubes can be rolled-up from bare-Ge wafer at almost any position, once these films are released from its substrate. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectGermaniumen_US
dc.subjectRolled-up microtubeen_US
dc.subjectIon-cuten_US
dc.titleRolling up Ge microtube from bare-Ge substrateen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2014.03.073en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume310en_US
dc.citation.spage214en_US
dc.citation.epage216en_US
dc.contributor.department奈米科技中心zh_TW
dc.contributor.departmentCenter for Nanoscience and Technologyen_US
dc.identifier.wosnumberWOS:000338805800036en_US
dc.citation.woscount0en_US
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