完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin, Chun-Hua | en_US |
dc.contributor.author | Cho, Sheng-Lung | en_US |
dc.contributor.author | Lin, Shiuan-Huei | en_US |
dc.contributor.author | Chi, Sien | en_US |
dc.contributor.author | Hsu, Ken-Yuh | en_US |
dc.date.accessioned | 2019-04-03T06:40:26Z | - |
dc.date.available | 2019-04-03T06:40:26Z | - |
dc.date.issued | 2014-11-01 | en_US |
dc.identifier.issn | 0091-3286 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1117/1.OE.53.11.112303 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/147816 | - |
dc.description.abstract | We investigate a two-wavelength method for recording a persistent hologram in a doped photopolymer. The recording method is based on two separated optical excitations of the four-energy-level system of the doped element, one at lambda = 325 nm as the sensitizing wavelength and the other at lambda = 647 nm as the writing wavelength, allowing for an experimental demonstration of nondestructive readout in phenanthrenequinone-doped poly(methyl methacrylate). Further, a four-energy-level rate equations model is proposed for describing the dynamics of hologram recording. The model successfully explains our experimental finding and further provides a general method to investigate such a two-wavelength holographic recording in photopolymer. (C) The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | two-wavelength holographic recording | en_US |
dc.subject | holography | en_US |
dc.subject | volume hologram | en_US |
dc.subject | photopolymers | en_US |
dc.subject | phenanthrenequinone-doped poly (methyl methacrylate) | en_US |
dc.title | Two-wavelength holographic recording in photopolymer using four-energy-level system: experiments and modeling | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1117/1.OE.53.11.112303 | en_US |
dc.identifier.journal | OPTICAL ENGINEERING | en_US |
dc.citation.volume | 53 | en_US |
dc.citation.issue | 11 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | 光電工程研究所 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.contributor.department | Department of Photonics | en_US |
dc.contributor.department | Institute of EO Enginerring | en_US |
dc.identifier.wosnumber | WOS:000347723600021 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |