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dc.contributor.authorLiang, Yu-Hsinen_US
dc.contributor.authorYu, Shih-Yingen_US
dc.contributor.authorHsin, Cheng-Lunen_US
dc.contributor.authorHuang, Chun-Weien_US
dc.contributor.authorWu, Wen-Weien_US
dc.date.accessioned2014-12-08T15:20:48Z-
dc.date.available2014-12-08T15:20:48Z-
dc.date.issued2011-10-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3643007en_US
dc.identifier.urihttp://hdl.handle.net/11536/14784-
dc.description.abstractWith the miniaturization of electron devices, the minuscule structures are important to state-of-the-art science and technology. Therefore, the growth methods and properties of nanomaterials have been extensively studied recently. Here, we use chemical vapor transport (CVT) methods to synthesize single-crystalline cobalt silicide nanowires (NWs) by using (CoCl(2)center dot 6H(2)O) as a single-source precursor. By changing reaction temperature and ambient pressure, we can obtain different morphology of cobalt silicide NWs under the appropriate concentration of silicon and cobalt. The field emission measurement of CoSi NWs shows low turn-on field (5.02 V/mu m) and it is outstanding for magnetic properties that differ from the bulk CoSi. The CoSi nanowires with different diameters have diversemagnetic saturation (Ms) and coercive force (Hc). (C) 2011 American Institute of Physics. [doi:10.1063/1.3643007]en_US
dc.language.isoen_USen_US
dc.titleGrowth of single-crystalline cobalt silicide nanowires with excellent physical propertiesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3643007en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume110en_US
dc.citation.issue7en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000295883000098-
dc.citation.woscount10-
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