標題: Investigating the improvement of resistive switching trends after post-forming negative bias stress treatment
作者: Tseng, Hsueh-Chih
Chang, Ting-Chang
Huang, Jheng-Jie
Yang, Po-Chun
Chen, Yu-Ting
Jian, Fu-Yen
Sze, S. M.
Tsai, Ming-Jinn
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: electrical conductivity transitions;electroforming;platinum;random-access storage;reliability;titanium compounds;ytterbium compounds
公開日期: 26-九月-2011
摘要: This paper investigates the improvement of resistive switching trends after post-forming negative bias stress treatment of a Pt/Yb(2)O(3)/TiN device that has undergone positive bias forming process for activation. After the treatment, characteristics of the conductive filament, such as the temperature dependence of resistivity and transition mechanism, undergo changes. Furthermore, this treatment causes the conductive filament to transform from being primarily composed of vacancies to being metallic Yb dominant, which not only reduces operation voltages such as V(set) and V(reset) but also improves the on/off ratio. In reliability tests, the device has stable retention. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3645004]
URI: http://dx.doi.org/10.1063/1.3645004
http://hdl.handle.net/11536/14789
ISSN: 0003-6951
DOI: 10.1063/1.3645004
期刊: APPLIED PHYSICS LETTERS
Volume: 99
Issue: 13
結束頁: 
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