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dc.contributor.authorChen, Guo-Juen_US
dc.contributor.authorJian, Sheng-Ruien_US
dc.contributor.authorJuang, Jenh-Yihen_US
dc.date.accessioned2019-04-02T05:58:34Z-
dc.date.available2019-04-02T05:58:34Z-
dc.date.issued2018-08-01en_US
dc.identifier.issn2079-6412en_US
dc.identifier.urihttp://dx.doi.org/10.3390/coatings8080266en_US
dc.identifier.urihttp://hdl.handle.net/11536/148074-
dc.description.abstractIn this study, Cu-doped ZnO (CZO) thin films were grown on glass substrates by using the radio frequency magnetron sputtering technique. The effects of Cu doping on the structural, surface morphological, optical properties, and wettability behaviors of CZO thin films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), UV-Visible spectroscopy, and contact angle measurement, respectively. The XRD results indicated that all CZO thin films were textured, having a preferential crystallographic orientation along the hexagonal wurtzite (002) axis. The average transmittance in the visible wavelength region was above 80% for all CZO thin films. The optical band gap of the CZO films decreased from 3.18 to 2.85 eV when the Cu-doping was increased from 2% to 10%. In addition, the water contact angle measurements were carried out to delineate the Cu-doping effects on the changes in the surface energy and wettability of the films.en_US
dc.language.isoen_USen_US
dc.subjectCu-doped ZnO thin filmen_US
dc.subjectXRDen_US
dc.subjectAFMen_US
dc.subjectUV-Visen_US
dc.subjectsurface energyen_US
dc.titleSurface Analysis and Optical Properties of Cu-Doped ZnO Thin Films Deposited by Radio Frequency Magnetron Sputteringen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/coatings8080266en_US
dc.identifier.journalCOATINGSen_US
dc.citation.volume8en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000443252300011en_US
dc.citation.woscount2en_US
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