完整後設資料紀錄
DC 欄位語言
dc.contributor.authorTseng, Chien-Mingen_US
dc.contributor.authorFushitani, Mizuhoen_US
dc.contributor.authorMatsuda, Akitakaen_US
dc.contributor.authorHishikawa, Akiyoshien_US
dc.date.accessioned2019-04-02T06:00:50Z-
dc.date.available2019-04-02T06:00:50Z-
dc.date.issued2018-10-01en_US
dc.identifier.issn0368-2048en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.elspec.2018.07.001en_US
dc.identifier.urihttp://hdl.handle.net/11536/148163-
dc.description.abstractIon-coincidence momentum imaging of Coulomb explosion of formaldehyde (H2CO) in femtosecond intense laser fields (800 nm, 1.3 x 10(15) W/cm(2)) is performed with two different laser pulse durations (7 fs and 35 fs). In the 7-fs laser fields, the full fragmentation pathway from H2CO4+ -> H+ + H+ + C+ + O+ is identified. The angles between the fragment momenta are well reproduced by a simple Coulomb explosion model from the geometry of neutral formaldehyde, showing that the molecular structure is virtually frozen along the bending coordinates during the multiple ionization. Three-body Coulomb explosion pathways from triply charged states, H2CO3+ -> H+ + H+ + C+ + O+, are observed in both the 7-fs and 35-fs laser fields. Significant changes in the momentum angle distribution and asymmetric energy partitioning between two H+ ions are observed in the 35-fs case, which are attributed to structural deformation prior to the Coulomb explosion in the longer pulse.en_US
dc.language.isoen_USen_US
dc.subjectCoulomb explosionen_US
dc.subjectIntense laser fieldsen_US
dc.subjectFormaldehydeen_US
dc.subjectCoincidence momentum imagingen_US
dc.subjectMolecular structureen_US
dc.titleCoincidence momentum imaging of four- and three-body Coulomb explosion of formaldehyde in ultrashort intense laser fieldsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.elspec.2018.07.001en_US
dc.identifier.journalJOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENAen_US
dc.citation.volume228en_US
dc.citation.spage25en_US
dc.citation.epage30en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000444932600005en_US
dc.citation.woscount0en_US
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