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dc.contributor.authorHuan, Ya-Weien_US
dc.contributor.authorWang, Xing-Luen_US
dc.contributor.authorLiu, Wen-Junen_US
dc.contributor.authorDong, Hongen_US
dc.contributor.authorLong, Shi-Bingen_US
dc.contributor.authorSun, Shun-Mingen_US
dc.contributor.authorYang, Jian-Guoen_US
dc.contributor.authorWu, Su-Dongen_US
dc.contributor.authorYu, Wen-Jieen_US
dc.contributor.authorHorng, Ray-Huaen_US
dc.contributor.authorXia, Chang-Taien_US
dc.contributor.authorYu, Hong-Yuen_US
dc.contributor.authorLu, Hong-Liangen_US
dc.contributor.authorSun, Qing-Qingen_US
dc.contributor.authorDing, Shi-Jinen_US
dc.contributor.authorZhang, David Weien_US
dc.date.accessioned2019-04-02T06:00:32Z-
dc.date.available2019-04-02T06:00:32Z-
dc.date.issued2018-10-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.7567/JJAP.57.100312en_US
dc.identifier.urihttp://hdl.handle.net/11536/148259-
dc.description.abstractThe energy band offsets between indium-gallium-zinc oxide (IGZO) and beta-Ga2O3 were examined by angle-resolved X-ray photoelectron spectroscopy (AR-XPS). The Ga 2p spectra from the heterojunction contributed by the upper IGZO film and the beta-Ga2O3 substrate were deconvoluted into two sub-peaks with the binding energy difference of 0.3 eV, in good agreement with the theoretical model. Meanwhile, the bandgaps of IGZO and beta-Ga2O3 were measured to be 3.44 +/- 0.1 and 4.64 +/- 0.1 eV from the ultraviolet-visible (UV-vis) transmittance spectra. The valence and conduction band offsets between the IGZO and beta-Ga2O3 were consequently determined to be 0.49 +/- 0.05 and 0.71 +/- 0.1 eV, respectively. These findings reveal that IGZO is an attractive intermediate semiconductor layer (ISL) for reducing the electron barrier height at metal/Ga2O3 interfaces. (C) 2018 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleBand alignment of indium-gallium-zinc oxide/beta-Ga2O3((2)over-bar01) heterojunction determined by angle-resolved X-ray photoelectron spectroscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/JJAP.57.100312en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume57en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000446553400001en_US
dc.citation.woscount1en_US
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