完整後設資料紀錄
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dc.contributor.authorVan-Qui Leen_US
dc.contributor.authorThi-Hien Doen_US
dc.contributor.authorRetamal, Jose Ramon Duranen_US
dc.contributor.authorShao, Pao-Wenen_US
dc.contributor.authorLai, Yu-Hongen_US
dc.contributor.authorWu, Wen-Weien_US
dc.contributor.authorHe, Jr-Hauen_US
dc.contributor.authorChueh, Yu-Lunen_US
dc.contributor.authorChu, Ying-Haoen_US
dc.date.accessioned2019-04-02T06:01:02Z-
dc.date.available2019-04-02T06:01:02Z-
dc.date.issued2019-02-01en_US
dc.identifier.issn2211-2855en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.nanoen.2018.10.042en_US
dc.identifier.urihttp://hdl.handle.net/11536/148698-
dc.description.abstractMultifunctional electronics featuring optical transparency, portability, mechanical flexibility, light-weight and environment-friendly are of great demands for next-generation smart electronics. Memristor represents one of the important chains in next-generation devices as the information computing and storage component. Here, we design the transparent flexible structure based on van der Waals heteroepitaxial AZO/NiO/AZO/muscovite (ANA/muscovite) for a memristor application. The (ANA/muscovite) memristor satisfies all the hardest requirements of a transparent soft device such as optical transparency over 80% in visible light and high performance with a ON/OFF resistance ratio > 10(5), stable endurance to 10(3) cycles and long retention time of 10(5) s. In addition, the ANA/muscovite memristor can work at various bending radii down to 5 mm, a mechanical bending after 1000 cycles at a curvature with a radius of 6.5 mm and a high temperature up to 185 degrees C, which deliver a pathway for future applications in flexible transparent smart electronics.en_US
dc.language.isoen_USen_US
dc.subjectAZO/NiO/AZO/muscoviteen_US
dc.subjectAluminum doped zinc oxide (AZO)en_US
dc.subjectVan der Waalsen_US
dc.subjectTransparent flexible memristoren_US
dc.titleVan der Waals heteroepitaxial AZO/NiO/AZO/muscovite (ANA/muscovite) transparent flexible memristoren_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.nanoen.2018.10.042en_US
dc.identifier.journalNANO ENERGYen_US
dc.citation.volume56en_US
dc.citation.spage322en_US
dc.citation.epage329en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000455264600033en_US
dc.citation.woscount0en_US
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