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dc.contributor.authorYang, Jianchengen_US
dc.contributor.authorFares, Chakeren_US
dc.contributor.authorRen, Fanen_US
dc.contributor.authorChen, Yen-Tingen_US
dc.contributor.authorLiao, Yu-Teen_US
dc.contributor.authorChang, Chin-Weien_US
dc.contributor.authorLin, Jenshanen_US
dc.contributor.authorTadjer, Markoen_US
dc.contributor.authorSmith, David J.en_US
dc.contributor.authorPearton, S. J.en_US
dc.contributor.authorKuramata, Akitoen_US
dc.date.accessioned2019-04-02T06:00:32Z-
dc.date.available2019-04-02T06:00:32Z-
dc.date.issued2019-01-30en_US
dc.identifier.issn2162-8769en_US
dc.identifier.urihttp://dx.doi.org/10.1149/2.0061907jssen_US
dc.identifier.urihttp://hdl.handle.net/11536/148792-
dc.description.abstractWe report the switching recovery characteristics of large area (contact dimension 0.04 x 0.04 cm(2)) vertical geometry beta-Ga2O3 Schottky rectifiers, consisting of Si-doped epitaxial layers on conducting bulk substrates. Devices that were switched from forward current of 0.225 A to reverse off-state voltage of -700 V in an inductive load test circuit showed a recovery time (t(rr)) of 82 ns, with a reverse recovery current (I-rr) of 38 mA and dI/dt of -2.28 A. mu sec(-1). This shows the potential of Ga2O3 rectifiers for power switching applications, provided effective thermal management schemes can be implemented. Devices deliberately tested to failure under forward bias conditions exhibit delamination and cracking of the Ni/Au contact and underlying epitaxial Ga2O3 due to the low thermal conductivity of the Ga2O3. This failure mode is different to that under high reverse breakdown conditions, where pits formed by material failure under the high field generated at the edge of the rectifying contact occurs. (C) The Author(s) 2019. Published by ECS.en_US
dc.language.isoen_USen_US
dc.titleSwitching Behavior and Forward Bias Degradation of 700V, 0.2A, beta-Ga2O3 Vertical Geometry Rectifiersen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/2.0061907jssen_US
dc.identifier.journalECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGYen_US
dc.citation.volume8en_US
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000457246200001en_US
dc.citation.woscount0en_US
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