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dc.contributor.authorDas, Kuhelien_US
dc.contributor.authorGoswami, Sanchitaen_US
dc.contributor.authorBeyene, Belete B.en_US
dc.contributor.authorYibeltal, Amogne W.en_US
dc.contributor.authorGarribba, Eugenioen_US
dc.contributor.authorFrontera, Antonioen_US
dc.contributor.authorDatta, Amitabhaen_US
dc.date.accessioned2019-04-02T06:00:26Z-
dc.date.available2019-04-02T06:00:26Z-
dc.date.issued2019-02-01en_US
dc.identifier.issn0277-5387en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.poly.2018.11.058en_US
dc.identifier.urihttp://hdl.handle.net/11536/148850-
dc.description.abstractThe mononuclear Cu-II derivative, [Cu(L)(H2O)(2)] (1) [where H2L = N,N'-bis(3-methoxysalicylidenimino)-1,3-diaminopropane] is afforded and systematically characterized. In 1, the central Cu-II atom is linked to the NNOO donor atoms of the di-compartmental Schiff base precursor and additionally coordinated with two water molecules; thus achieves a distorted octahedral geometry. The EPR spectrum is simulated with WinEPR software having g(II)= 2.210 and g(perpendicular to)= 2.041. We also conduct the DFT computational study which fits well with experimental affirmation. The room temperature magnetic susceptibility of complex 1 confirms the effective magnetic moment (mu(eff)) value as 1.99 B.M. The electrochemical measurement using cyclic voltammetry showed redox potentials at +0.63, -1.25, and -1.82 V versus AgiAgC1, which are due to reversible and rapid Cu(III/II), Cu(II/I) and Cu(I/O) process. (C) 2018 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectCu(II)en_US
dc.subjectCrystal structureen_US
dc.subjectEPRen_US
dc.subjectDFTen_US
dc.subjectRedoxen_US
dc.titleEPR, DFT and electrochemical interpretation of a Cu(II) derivative incorporating a Schiff base precursoren_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.poly.2018.11.058en_US
dc.identifier.journalPOLYHEDRONen_US
dc.citation.volume159en_US
dc.citation.spage323en_US
dc.citation.epage329en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000458228000037en_US
dc.citation.woscount0en_US
Appears in Collections:Articles