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dc.contributor.authorCheng, Hui-Wenen_US
dc.contributor.authorLin, Shen-Chiehen_US
dc.contributor.authorLi, Zong-Linen_US
dc.contributor.authorSun, Kien-Wenen_US
dc.contributor.authorLee, Chien-Pingen_US
dc.date.accessioned2019-04-02T05:58:19Z-
dc.date.available2019-04-02T05:58:19Z-
dc.date.issued2019-01-02en_US
dc.identifier.issn1996-1944en_US
dc.identifier.urihttp://dx.doi.org/10.3390/ma12020317en_US
dc.identifier.urihttp://hdl.handle.net/11536/148922-
dc.description.abstractThis paper discusses the issue of controlling the epitaxial growth of mixed group V alloys to form a type-I InGaAsSb/AlGaAsSb double quantum wells (QWs) structure. We also discuss the run-to-run reproducibility of lattice-matched AlGaAsSb alloys and strained In0.35Ga0.65As0.095Sb0.905 in terms of growth parameters (V/III ratio, Sb-2/As-2 ratio). Molecular beam epitaxy (MBE) was used to grow two type-I InGaAsSb double-QWs laser structures differing only in the composition of the bottom cladding layer: Al0.85Ga0.15As0.072Sb0.928 (sample A) and Al0.5Ga0.5As0.043Sb0.957 (sample B). Both samples were respectively used in the fabrication of photonic crystal surface-emitting lasers (PCSELs). Sample A presented surface lasing action from circular as well as triangular photonic crystals. Sample B did not present surface lasing due to the deterioration of the active region during the growth of the upper cladding. Our findings underline the importance of temperature in the epitaxial formation of AlxGa1-xAsySb1-y in terms of lasing performance.en_US
dc.language.isoen_USen_US
dc.subjectType-I QWen_US
dc.subjectInGaAsSben_US
dc.subjectAlGaAsSben_US
dc.subjectMBEen_US
dc.subjectlattice matcheden_US
dc.subjectPCSELen_US
dc.titlePCSEL Performance of Type-I InGaAsSb Double-QWs Laser Structure Prepared by MBEen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/ma12020317en_US
dc.identifier.journalMATERIALSen_US
dc.citation.volume12en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department奈米科技中心zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentCenter for Nanoscience and Technologyen_US
dc.identifier.wosnumberWOS:000459719000121en_US
dc.citation.woscount0en_US
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