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| Effects of base oxide thickness and silicon composition on charge trapping in HfSiO/SiO2 high-k gate stacks | 12 |
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| Effects of base oxide thickness and silicon composition on charge trapping in HfSiO/SiO2 high-k gate stacks | 0 | 0 | 0 | 1 | 6 | 1 | 1 |
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